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LAKE SUCCESS,
NY, March 6, 2001… Park Electrochemical
Corp. (NYSE-PKE)
announced that one of its most advanced series of multilayer products,
the N6000 and N6000 SI™ products, have recently gained wider acceptance
in digital broadband applications, which include optical routers,
high speed/low loss network storage and cellular infrastructure.
The N6000 series is based on proprietary resins from Asahi Kasei.
N6000 SI™ is a higher frequency version of the N6000 utilizing Park/Nelco's
advanced SI™ technology.
Park also announced
that in support of the growing demand for these advanced products
and in response to the more exacting standards required by digital
broadband applications, it has recently completed Conductive Anodic
Filament (CAF) testing of its N6000 product line. CAF testing is
a stringent reliability test used most frequently to evaluate high
density interconnection systems for sustained performance.
Bob Forcier,
Senior Vice President of OEM Marketing and Technology stated, "The
N6000 and N6000 SI™ products incorporate Park/Nelco's highest performing
advanced multilayer material technologies. We believe these products
provide excellent solutions to signal integrity requirements in
very high layer count multilayers, backplanes and modules. We are
presently supporting OC 192 and anticipate supporting OC 768 Optical
Routing Protocols with both of these high speed products. Advanced
optical routers require very reliable signal integrity performance
operating across high layer count structures. Our recent successes
in passing a major OEM's requirement for CAF resistance and in passing
other high reliability tests, including Interconnect Stress Testing
(IST), confirms the suitability of the N6000 products in these high
performance applications."
Certain portions
of this press release may be deemed to constitute forward looking
statements that are subject to various factors which could cause
actual results to differ materially from Park's expectations. Such
factors include, but are not limited to, general conditions in the
electronics industry, Park's competitive position, the status of
Park's relationship with its customers, economic conditions in international
markets, the cost and availability of utilities, and the various
factors set forth under the caption "Factors That May Affect Future
Results" after Item 7 of Park's Annual Report on Form 10-K for the
fiscal year ended February 27, 2000.
Park Electrochemical
Corp. is a leading global designer and producer of electronic materials
used to fabricate complex multilayer printed circuit board and interconnection
systems. Park specializes in advanced materials for high layer count
circuit boards and high speed digital broadband telecommunications,
internet and networking applications. Park's electronic materials
business operates through fully integrated business units in Asia,
Europe and North America. The Company's major manufacturing facilities
are located in Singapore, England, France, Germany, New York, Arizona
and California. Park's electronic materials business operates under
the "Nelco" name.
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